发明名称 Charged particle beam inspection apparatus and inspection method using charged particle beam
摘要 A charged particle beam inspection apparatus includes: an electron gun emitting an electron beam; first and second condenser lenses used to focus the electron beam; a beam control panel disposed between the first and second condenser lenses; and a control unit performing stabilizing processing in which excitation currents respectively supplied to the first condenser lens and the second condenser lens are set to have predetermined values, thereby the current amount of the electron beam passing through an opening of the beam control panel is regulated so that the electron beam to be emitted onto the sample has a larger current amount than that at a measurement, and then the electron beam is emitted onto the sample for a predetermined time period. After the stabilizing processing, the control unit sets the values of the excitation currents back to values for the measurement in order to measure dimensions of the sample, the excitation currents respectively supplied to the first and second condenser lenses.
申请公布号 US8507857(B2) 申请公布日期 2013.08.13
申请号 US20090653013 申请日期 2009.12.07
申请人 ITOU KEISUKE;IWAI TOSHIMICHI;ADVANTEST CORP. 发明人 ITOU KEISUKE;IWAI TOSHIMICHI
分类号 G21K7/00 主分类号 G21K7/00
代理机构 代理人
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