发明名称 |
Coating and developing apparatus, coating and developing method and non-transitory tangible medium |
摘要 |
A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed. |
申请公布号 |
US8506186(B2) |
申请公布日期 |
2013.08.13 |
申请号 |
US201113225985 |
申请日期 |
2011.09.06 |
申请人 |
HAYASHI SHINICHI;DOUKI YUICHI;MIYATA AKIRA;YAMAMOTO YUUICHI;YOSHIHARA KOUSUKE;MATSUOKA NOBUAKI;ENOKIDA SUGURU;TOKYO ELECTRON LIMITED |
发明人 |
HAYASHI SHINICHI;DOUKI YUICHI;MIYATA AKIRA;YAMAMOTO YUUICHI;YOSHIHARA KOUSUKE;MATSUOKA NOBUAKI;ENOKIDA SUGURU |
分类号 |
G03D5/00 |
主分类号 |
G03D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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