发明名称 Semiconductor device and manufacturing method thereof
摘要 The semiconductor device of the invention includes a transistor, an insulating layer provided over the transistor, a first conductive layer (corresponding to a source wire or a drain wire) electrically connected to a source region or a drain region of the transistor through an opening portion provided in the insulating layer, a first resin layer provided over the insulating layer and the first conductive layer, a layer containing conductive particles which is electrically connected to the first conductive layer through an opening portion provided in the first resin layer, and a substrate provided with a second resin layer and a second conductive layer serving as an antenna. In the semiconductor device having the above-described structure, the second conductive layer is electrically connected to the first conductive layer with the layer containing conductive particles interposed therebetween. In addition, the second resin layer is provided over the first resin layer.
申请公布号 US8508027(B2) 申请公布日期 2013.08.13
申请号 US20090555832 申请日期 2009.09.09
申请人 TAKAHASHI HIDEKAZU;YAMADA DAIKI;ITO KYOSUKE;SUGIYAMA EIJI;DOZEN YOSHITAKA;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TAKAHASHI HIDEKAZU;YAMADA DAIKI;ITO KYOSUKE;SUGIYAMA EIJI;DOZEN YOSHITAKA
分类号 H01L23/552 主分类号 H01L23/552
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