发明名称 Phase-change memory device and method of fabricating the same
摘要 A phase-change memory device with improved deposition characteristic and a method of fabricating the same are provided. The phase-change memory device includes a semiconductor substrate having a phase-change area, a first material-rich first phase-change layer forming an inner surface of the phase-change area and comprised of a hetero compound of the first material and a second material, and a second phase-change layer formed on a surface of the first phase-change layer to fill the phase-change area.
申请公布号 US8508021(B2) 申请公布日期 2013.08.13
申请号 US20100962183 申请日期 2010.12.07
申请人 LEE KEUN;KIM JIN HYOCK;KWON YOUNG SEOK;HYNIX SEMICONDUCTOR INC. 发明人 LEE KEUN;KIM JIN HYOCK;KWON YOUNG SEOK
分类号 H01L45/00 主分类号 H01L45/00
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