发明名称 Radio frequency device and method for fabricating the same
摘要 A radio frequency (RF) device that can achieve high frequency response while maintaining high output impedance and high breakdown voltage includes a substrate, a gate, at least a dummy gate, at least a doped region, a source region and a drain region. The substrate includes a well of first type and a well of second type. The well of second type is adjacent to the well of first type.
申请公布号 US8507987(B2) 申请公布日期 2013.08.13
申请号 US20090563434 申请日期 2009.09.21
申请人 HUANG SHENG-YI;HUNG CHENG-CHOU;LI TZUNG-LIN;TSENG CHIN-LAN;LIANG VICTOR-CHIANG;TSENG CHIH-YU;UNITED MICROELECTRONICS CORP. 发明人 HUANG SHENG-YI;HUNG CHENG-CHOU;LI TZUNG-LIN;TSENG CHIN-LAN;LIANG VICTOR-CHIANG;TSENG CHIH-YU
分类号 H01L29/66;H01L21/336 主分类号 H01L29/66
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