发明名称 |
Illumination optical system, exposure apparatus, and device manufacturing method |
摘要 |
An illumination optical system for illuminating an irradiated plane M with illumination light provided from a light source includes a spatial light modulator, which is arranged in an optical path of the illumination optical system and forms a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position, and a diffuser, which is arranged at an incidence side of the spatial light modulator through which the illumination light enters.
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申请公布号 |
US8508717(B2) |
申请公布日期 |
2013.08.13 |
申请号 |
US201213484051 |
申请日期 |
2012.05.30 |
申请人 |
TANAKA HIROHISA;NIKON CORPORATION |
发明人 |
TANAKA HIROHISA |
分类号 |
G02B5/02;G03B27/32;G03B27/54;G03B27/72 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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