发明名称 Radiation source and lithographic apparatus
摘要 A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.
申请公布号 US8507882(B2) 申请公布日期 2013.08.13
申请号 US20090543578 申请日期 2009.08.19
申请人 SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;MOORS JOHANNES HUBERTUS JOSEPHINA;ASML NETHERLANDS B.V. 发明人 SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;MOORS JOHANNES HUBERTUS JOSEPHINA
分类号 G03B27/42;H01J19/12 主分类号 G03B27/42
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