发明名称 |
Radiation source and lithographic apparatus |
摘要 |
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.
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申请公布号 |
US8507882(B2) |
申请公布日期 |
2013.08.13 |
申请号 |
US20090543578 |
申请日期 |
2009.08.19 |
申请人 |
SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;MOORS JOHANNES HUBERTUS JOSEPHINA;ASML NETHERLANDS B.V. |
发明人 |
SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;MOORS JOHANNES HUBERTUS JOSEPHINA |
分类号 |
G03B27/42;H01J19/12 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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