发明名称 Particle beam microscopy system and method for operating the same
摘要 A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.
申请公布号 US8507854(B2) 申请公布日期 2013.08.13
申请号 US20100804139 申请日期 2010.07.13
申请人 BUEHLER WOLFRAM;DOEMER HOLGER;LANG MATTHIAS;STODOLKA JOERG;ROEDIGER PETER;BERTAGNOLLI EMMERICH;WANZENBOECK HEINZ;CARL ZEISS MICROSCOPY GMBH 发明人 BUEHLER WOLFRAM;DOEMER HOLGER;LANG MATTHIAS;STODOLKA JOERG;ROEDIGER PETER;BERTAGNOLLI EMMERICH;WANZENBOECK HEINZ
分类号 H01J37/30 主分类号 H01J37/30
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