发明名称 |
Particle beam microscopy system and method for operating the same |
摘要 |
A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.
|
申请公布号 |
US8507854(B2) |
申请公布日期 |
2013.08.13 |
申请号 |
US20100804139 |
申请日期 |
2010.07.13 |
申请人 |
BUEHLER WOLFRAM;DOEMER HOLGER;LANG MATTHIAS;STODOLKA JOERG;ROEDIGER PETER;BERTAGNOLLI EMMERICH;WANZENBOECK HEINZ;CARL ZEISS MICROSCOPY GMBH |
发明人 |
BUEHLER WOLFRAM;DOEMER HOLGER;LANG MATTHIAS;STODOLKA JOERG;ROEDIGER PETER;BERTAGNOLLI EMMERICH;WANZENBOECK HEINZ |
分类号 |
H01J37/30 |
主分类号 |
H01J37/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|