发明名称 FILM FORMATION APPARATUS AND FILM FORMATION METHOD
摘要 PURPOSE: An apparatus and method for forming a film are provided to easily laminate a reaction product by repeating a cycle to successively supply various kinds of processing gases several times. CONSTITUTION: A rotary table (2) is installed in a vacuum container. The vacuum container includes a ceiling panel (11) and a container body. A separation gas supplying unit supplies a separation gas. A modifying gas supplying unit supplies a modifying gas to a modifying area. A first plasma generating unit (81) changes the modifying gas to plasma. [Reference numerals] (AA,BB,CC,DD) N2 gas
申请公布号 KR20130089607(A) 申请公布日期 2013.08.12
申请号 KR20130011848 申请日期 2013.02.01
申请人 TOKYO ELECTRON LIMITED 发明人 KATO HITOSHI;MIURA SHIGEHIRO
分类号 H01L21/205 主分类号 H01L21/205
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