发明名称 |
HEAT TREATMENT APPARATUS AND METHOD OF CONTROLLING THE SAME |
摘要 |
PURPOSE: A heat processing apparatus and a controlling method thereof are provided to prevent the overshoot of a temperature by including a step of selecting a temperature control model. CONSTITUTION: A processing chamber receives an object. A heating unit heats the object. A memory unit memorizes two or more temperature control models. A temperature control unit (36) controls the temperature of the heating unit. A device control unit (100) controls the temperature control unit and the memory unit. [Reference numerals] (111,121) Model memory unit; (112) Recipe memory unit; (115,125) I/O port; (118) Operating panel; (28) Pressure control unit; (AA) Mass flow controller |
申请公布号 |
KR20130089586(A) |
申请公布日期 |
2013.08.12 |
申请号 |
KR20130002791 |
申请日期 |
2013.01.10 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TAKAHASHI GORO;KASAI TAKAHITO;SAITO TAKANORI;WANG WENLING;YOSHII KOJI;YAMAGUCHI TATSUYA |
分类号 |
H01L21/205;C23C16/46;C23C16/52 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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