发明名称 HEAT TREATMENT APPARATUS AND METHOD OF CONTROLLING THE SAME
摘要 PURPOSE: A heat processing apparatus and a controlling method thereof are provided to prevent the overshoot of a temperature by including a step of selecting a temperature control model. CONSTITUTION: A processing chamber receives an object. A heating unit heats the object. A memory unit memorizes two or more temperature control models. A temperature control unit (36) controls the temperature of the heating unit. A device control unit (100) controls the temperature control unit and the memory unit. [Reference numerals] (111,121) Model memory unit; (112) Recipe memory unit; (115,125) I/O port; (118) Operating panel; (28) Pressure control unit; (AA) Mass flow controller
申请公布号 KR20130089586(A) 申请公布日期 2013.08.12
申请号 KR20130002791 申请日期 2013.01.10
申请人 TOKYO ELECTRON LIMITED 发明人 TAKAHASHI GORO;KASAI TAKAHITO;SAITO TAKANORI;WANG WENLING;YOSHII KOJI;YAMAGUCHI TATSUYA
分类号 H01L21/205;C23C16/46;C23C16/52 主分类号 H01L21/205
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