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发明名称
光阻剥离组成物及剥离光阻之方法
摘要
本发明系有关于一种光阻剥离组成物。尤其,本发明之光阻剥离组成物包括式1所示之化合物,其具有优异的光阻剥离力,且当钼(Mo)包含于光阻下层膜时,其对于光阻下层膜展现优异的抗腐蚀效果。
申请公布号
TWI405053
申请公布日期
2013.08.11
申请号
TW098140560
申请日期
2009.11.27
申请人
LG化学公司 南韩
发明人
闵盛晙;权赫俊;朴珉春
分类号
G03F7/42;H01L21/027
主分类号
G03F7/42
代理机构
代理人
吴冠赐 台北市松山区敦化北路102号9楼;苏建太 台北市松山区敦化北路102号9楼
主权项
地址
南韩
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