发明名称 MAGNETIC FIELD GENERATOR FOR MAGNETRON SPUTTERING
摘要 <p>A magnetic field generator which is used in magnetron sputtering and which includes at least one permanent magnet for adjusting a magnetic field, has a race-track shape comprising straight-line sections and corner sections. The magnetic field generator has, provided on a base thereof comprising a non-magnetic material, bar-shaped central-magnetic-pole members, peripheral-magnetic-pole members disposed so as to surround the central-magnetic-pole members, and a plurality of permanent magnets disposed between the central-magnetic-pole members and the peripheral-magnetic-pole members such that one magnetic pole thereof faces the central-magnetic-pole members and the other magnetic pole thereof faces the peripheral-magnetic-pole members. The plurality of permanent magnets disposed on the straight-line sections are thinner in the direction orthogonal to a target surface than at both end sections of a central section in the magnetization direction.</p>
申请公布号 WO2013115030(A1) 申请公布日期 2013.08.08
申请号 WO2013JP51277 申请日期 2013.01.23
申请人 HITACHI METALS, LTD. 发明人 KURIYAMA YOSHIHIKO
分类号 C23C14/35 主分类号 C23C14/35
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