发明名称 SURFACE EMITTING LASER ARRAY
摘要 PROBLEM TO BE SOLVED: To provide a surface emitting laser array which can reduce the difference of etching depth in the in-plane direction of a substrate without using a dummy element.SOLUTION: The surface emitting laser array includes a plurality of surface emitting laser elements each consisting of the structure of a surface emitting laser element 1. In the surface emitting laser element 1, a reflective layer 102 consists of (n-AlAs/n-AlGaAs) of 40.5 period, and each of resonator spacer layers 103 and 105 consists of (AlGa)InP. An active layer 104 consists of a quantum well structure including a well layer consisting of GaInPAs, and a barrier layer consisting of GaInP. Furthermore, a reflective layer 106 consists of (p-AlGaAs/AlGaAs) of 24 periods. A bottom face of a mesa structure is located in the way of the resonator spacer layer 103 which absorbs the difference of etching depth in the reflective layer 106.
申请公布号 JP2013153225(A) 申请公布日期 2013.08.08
申请号 JP20130100843 申请日期 2013.05.13
申请人 RICOH CO LTD 发明人 SATO SHUNICHI;ITO AKIHIRO
分类号 H01S5/183 主分类号 H01S5/183
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