发明名称 METHOD FOR PRODUCING LOW-FRICTION SUBSTRATES
摘要 <p>Provided is a method for producing low-friction substrates which at least includes: a step for projecting an electron beam onto a resin layer of a substrate having the resin layer on the surface thereof; and a step for adhering a silicone component to the surface of the resin layer, after irradiating the resin layer with the electron beam.</p>
申请公布号 WO2013115237(A1) 申请公布日期 2013.08.08
申请号 WO2013JP52023 申请日期 2013.01.30
申请人 NITTO DENKO CORPORATION 发明人 KAWASAKI, MOTOKO;FUJISAWA, JUNICHI;OHMORI, YUTAKA;HYODO, TOMONORI
分类号 C08J7/04;B32B27/00;G02B5/26 主分类号 C08J7/04
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