发明名称 SELF-ALIGNED PROCESS TO FABRICATE A MEMORY CELL ARRAY WITH A SURROUNDING-GATE ACCESS TRANSISTOR
摘要 A memory array including a plurality of memory cells. Each word line is electrically coupled to a set of memory cells, a gate contact and a pair of dielectric pillars positioned parallel to the word line and placed on both sides of the gate contact over a layer of insulating material. Also a method to prevent a gate contact from electrically connecting to a source contact for a plurality of memory cells on a substrate. The method includes formation of a pair of pillars over an insulating material on the substrate, depositing an electrically conductive gate material between and over the pillars, etching the gate material such that it both partially fills a space between the pair of pillars and forms a word line for the memory cells, and depositing a gate contact between the dielectric pillars such that the gate contact is in electrical contact with the gate material.
申请公布号 US2013200330(A1) 申请公布日期 2013.08.08
申请号 US201213369246 申请日期 2012.02.08
申请人 BRIGHTSKY MATTHEW J.;LAM CHUNG H.;LAUER GEN P.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BRIGHTSKY MATTHEW J.;LAM CHUNG H.;LAUER GEN P.
分类号 H01L27/105;H01L21/8239 主分类号 H01L27/105
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