| 摘要 |
PROBLEM TO BE SOLVED: To supply a target substance stably to a plasma generating region.SOLUTION: The target supply device may include a nozzle in which a through hole for discharging a target substance is formed, a cover including a conductive member, provided with a through hole so as to pass the target substance, and provided to cover the nozzle, a first electrode disposed on the side opposite from the nozzle for the cover, and provided with a through hole so as to pass the target substance, and a potential control unit for controlling the potential of the first electrode so as to be the second potential lower than the first potential of the conductive member included in the cover. |
