ANTIREFLECTIVE COMPOSITION FOR PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide an antireflective coating by which clean images are obtained with good lithographic properties when the antireflective coating is used with a photoresist in an imaging process.SOLUTION: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycol uryl compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a method for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.