发明名称 |
ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE |
摘要 |
Using a photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer. |
申请公布号 |
EP2381309(B1) |
申请公布日期 |
2013.08.07 |
申请号 |
EP20090833225 |
申请日期 |
2009.12.18 |
申请人 |
ASAHI KASEI E-MATERIALS CORPORATION |
发明人 |
ISO, CHISATO |
分类号 |
G03F1/00;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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