| 摘要 |
A substrate processing apparatus and a gas supplying apparatus for the same are provided to achieve constant gas supply into a chamber and stabilize the unstable gas flow due to asymmetrical supply of process gas, by placing gas supply nozzles at regular intervals. A substrate processing apparatus comprises a chamber(100), a plurality of gas supply nozzles, a plurality of mass flow controllers(140), and first and second O-rings. The chamber comprises a plurality of installation parts for installation of the gas supply nozzles penetrating therethrough, wherein a supply tube(230) is inserted into a nozzle to supply process gas to the nozzle. The gas supply nozzles are installed at regular intervals along inner circumference of the chamber to supply process gas into the gas. The flow controllers respectively control the process gas to be supplied into each gas supply nozzle. The first O-ring is installed between the nozzle and an outer wall of the chamber, and the second O-ring is installed between an outer surface of the nozzle and a connection head connected to the supply tube. |
