发明名称 Positioning apparatus and exposure apparatus, method of operating a positioning apparatus and device manufacturing method
摘要 <p>Positioning apparatus arranged in a vacuum atmosphere comprises: a supporting means including a combination of a magnet arranged on a bottom plate and an electromagnet arranged on a top plate so that the spring element can virtually be disregarded; and a linear motor enabling driving for performing positioning of a substrate subjected to positioning without a contact and including a magnet on a movable member side and a coil on a stationary member side. The positioning apparatus employs a noncontact heat controller to externally control the temperature of the substrate without a contact, through a radiation plate, Peltier element and cooling plate supported by a supporting member of the bottom plate, and a black body arranged on the top plate opposed to the radiation plate. <IMAGE></p>
申请公布号 EP1947512(B1) 申请公布日期 2013.08.07
申请号 EP20080008011 申请日期 2002.08.14
申请人 CANON KABUSHIKI KAISHA 发明人 EMOTO, KEIJI
分类号 G03F7/20;G05D3/12;G05D23/27;H01L21/00;H01L21/027 主分类号 G03F7/20
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