| 摘要 |
PURPOSE: A method for manufacturing sputtering target and a sputtering target using the same are provided to manufacture the large size sputtering target by producing the sintered body of the large size through the package of the two molding products at least. CONSTITUTION: The method for manufacturing sputtering target is as follows. At least, two molding products(112,114) are prepared. The two molding products are arranged. The adjacent molding products are contacted. The two molding products are integrated and manufacture the sintered body. After the sintered body is manufactured, the contact part between adjacent molding products is polished. At least, the size of two molding products is different. At least, the two molding products include the indium tin oxide and tin oxide. The two molding products include the calcium oxide, the magnesium oxide, the zirconium oxide yttrium oxide lineage ceramics, the titanium oxide, the calcium carbonate, the magnesium carbonate, the tartaric acid calcium, the tartaric acid magnesium, and the titan acid tartaric and indium acid calcium. The sintered body is welded to the backing plate. |
