| 摘要 |
<p>An electrostatic chuck includes a substrate, inner electrode and outer electrodes each made of a metal and concentrically buried in the substrate, a plurality of embossed portions formed on a main plane of the substrate, a projecting portion made of the same material as that of said plurality of the embossed portions and formed on substantially an entire outer peripheral portion on the main plane of the substrate on which the embossed portions are formed, wherein positive and negative potentials are to be applied to the inner and outer electrode, respectively, or vice versa, an object to be treated is to be supported by the embossed portions and the projecting portion, and a sum of a total area of upper surfaces of the embossed portions in an outer electrode-located zone of the substrate and an area of an upper surface of the projecting portion in the outer electrode-located zone of the substrate is in a range of 0.7 to 1.3 of a total area of upper surfaces of the embossed portions in an inner electrode-located zone of the substrate. <IMAGE></p> |
