发明名称 Semiconductor element, semiconductor device, and method for manufacturing the same
摘要 The semiconductor element includes an oxide semiconductor layer on an insulating surface; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; a gate insulating layer over the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; and a gate electrode layer over the gate insulating layer. The source electrode layer and the drain electrode layer have sidewalls which are in contact with a top surface of the oxide semiconductor layer.
申请公布号 US8501564(B2) 申请公布日期 2013.08.06
申请号 US20100956624 申请日期 2010.11.30
申请人 SUZAWA HIDEOMI;KURATA MOTOMU;MIKAMI MAYUMI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 SUZAWA HIDEOMI;KURATA MOTOMU;MIKAMI MAYUMI
分类号 H01L21/336;H01L29/788 主分类号 H01L21/336
代理机构 代理人
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