RETAINER RING OF CARRIER HEAD OF CHEMICAL MECHANICAL APPARATUS AND MEMBRANE USED THEREIN

摘要

PURPOSE: A retainer ring for a carrier head of a chemical mechanical polishing apparatus is provided to implement a uniform polishing operation by forming a pressurizing chamber on the upper lateral side of a membrane. CONSTITUTION: A bottom plate (341) pressurizes the planar side of a wafer. A lateral side (342) is vertically bent on the edge of the bottom plate. A membrane includes a first fixing flip (3421). The first fixing flip is extended from the upper side of the lateral side to the outside of a diameter. The first fixing flip is fixed in a reentrant groove.