发明名称 Stacked layers of nitride semiconductor and method for manufacturing the same
摘要 According to one embodiment, stacked layers of a nitride semiconductor include a substrate, a single crystal layer and a nitride semiconductor layer. The substrate does not include a nitride semiconductor and has a protrusion on a major surface. The single crystal layer is provided directly on the major surface of the substrate to cover the protrusion, and includes a crack therein. The nitride semiconductor layer is provided on the single crystal layer.
申请公布号 US8502350(B2) 申请公布日期 2013.08.06
申请号 US201113102204 申请日期 2011.05.06
申请人 SUGAWARA HIDETO;ONOMURA MASAAKI;KABUSHIKI KAISHA TOSHIBA 发明人 SUGAWARA HIDETO;ONOMURA MASAAKI
分类号 H01L29/20 主分类号 H01L29/20
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