发明名称 Semiconductor device with improved on-resistance
摘要 A semiconductor device includes a source, a drain, and a gate configured to selectively enable a current to pass between the source and the drain. The semiconductor device includes a drift zone between the source and the drain and a first field plate adjacent the drift zone. The semiconductor device includes a dielectric layer electrically isolating the first field plate from the drift zone and charges within the dielectric layer close to an interface of the dielectric layer adjacent the drift zone.
申请公布号 US8502315(B2) 申请公布日期 2013.08.06
申请号 US201213463243 申请日期 2012.05.03
申请人 MAUDER ANTON;BERGER RUDOLF;HIRLER FRANZ;SIEMIENIEC RALF;SCHULZE HANS-JOACHIM;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 MAUDER ANTON;BERGER RUDOLF;HIRLER FRANZ;SIEMIENIEC RALF;SCHULZE HANS-JOACHIM
分类号 H01L29/78 主分类号 H01L29/78
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