发明名称 |
Anti-reflective coating forming composition containing vinyl ether compound |
摘要 |
There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.
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申请公布号 |
US8501393(B2) |
申请公布日期 |
2013.08.06 |
申请号 |
US20050596391 |
申请日期 |
2005.05.11 |
申请人 |
HATANAKA TADASHI;KIMURA SHIGEO;ENOMOTO TOMOYUKI;NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
HATANAKA TADASHI;KIMURA SHIGEO;ENOMOTO TOMOYUKI |
分类号 |
G03F7/11;G03F7/039;G03F7/09;G03F7/095;G03F7/16;G03F7/20;G03F7/38;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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