发明名称 Beam control assembly for ribbon beam of ions for ion implantation
摘要 A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the first bar. The first coil is the only coil disposed on the first bar. The second bar is disposed opposite the first bar with a gap defined between the first and second bars. The ribbon beam travels between the gap. The second coil is disposed on the second bar. The second coil is the only coil disposed on the second bar. The first electrical power supply is connected to the first coil without being electrically connected to any other coil. The second electrical power supply is connected to the second coil without being electrically connected to any other coil.
申请公布号 US8502160(B2) 申请公布日期 2013.08.06
申请号 US20100957294 申请日期 2010.11.30
申请人 CHEN JIONG;ADVANCED ION BEAM TECHNOLOGY, INC. 发明人 CHEN JIONG
分类号 G21K1/08 主分类号 G21K1/08
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