发明名称 MANUFACTURING METHOD FOR MOLDS FOR NANOIMPRINTING
摘要 <p>The present invention relates to a method for producing m (where, m is an integer of 1 or more) number of molds for nanoimprinting in which anodic alumina having a microrelief structure composed of a plurality of pores is formed on the surface of an aluminum base material, wherein the method has one or more anodic oxidation steps for anodically oxidizing an aluminum base material in an electrolytic solution for each of m number of aluminum base materials, and a difference (X-X0) between the aluminum concentration X in the electrolytic solution and the aluminum concentration X0 in the electrolytic solution immediately prior to the first anodic oxidation step of the first aluminum base material is 1000 ppm or less in all of the anodic oxidation steps.</p>
申请公布号 KR20130087055(A) 申请公布日期 2013.08.05
申请号 KR20137017632 申请日期 2012.07.13
申请人 MITSUBISHI RAYON CO., LTD. 发明人 OZAWA SATORU;KOJIMA KATSUHIRO
分类号 H01L21/027;B29C33/38;B29C59/02 主分类号 H01L21/027
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