| 摘要 |
PURPOSE: A variable capacitor, an impedance matching apparatus, and a substrate processing apparatus are provided to steadily transmit the electricity by reducing the reflected power, and are provided to uniformly maintain the plasma density inside a process chamber. CONSTITUTION: An impedance matching apparatus (3000) comprises a matching circuit (3100), a controller (3200), an impedance meter (3300), and a reflected power meter (3400). The matching circuit matches the impedance of a process chamber (1000) side and a high frequency power (2000) side. The impedance meter measures the impedance of the process chamber and transmits the measured value to the controller. The reflected power meter measures the reflected power by the reflected wave and transmits the measured value to the controller. The controller generates a control signal for the impedance compensation based on the measured value of the impedance meter and the reflected power meter, transmits the control signal to the matching circuit, and controls the matching circuit. [Reference numerals] (2000) High frequency power supply; (3100) Matching circuit; (3200) Controller; (3300) Impedance measuring device; (3400) Reflected power measuring device; (AA) Plasma |
