| 摘要 |
A member for a plasma treatment apparatus is provided, which has excellent anti-sticking properties, is suitable, for example, as a lower electrode in CVD apparatuses, has a stable shape as the lower electrode, and can suppress abnormal discharge during plasma treatment. The member for a plasma treatment apparatus comprises a base material formed of an aluminum alloy having a smoothly machined surface and a treated anodic oxide coating provided on the surface of the base material and formed by hydrating an anodic oxide coating formed on the surface of the base material to form microcracks therein. The anodic oxide coating has a leak current density of more than 0.9×10−5 A/cm2 at an applied voltage of 100 V, a thickness of not less than 3μm, an arithmetic average surface roughness of less than 1μm, and a dissolution rate of less than 100 mg/dm2/15 min in a phosphoric and chromic acid immersion test. The flatness of the surface on which the anodic oxide coating has been formed is not more than 50μm. |
