LOW TEMPERATURE NIX PROCESS APPARATUS AND METHOD THEREOF

摘要

PURPOSE: A low temperature NIX processing apparatus and a method thereof are provided to reduce deposition time by maintaining a coating chamber at a low temperature. CONSTITUTION: A coating chamber (100) includes a frame and/or a supporter. The frame and the supporter form a thermoelectric element respectively. A measuring part (200) measures the inner temperature of the coating chamber. A control part (300) cools the frame and/or the supporter. The control part controls the inner temperature of the coating chamber at a low temperature of 5 - 10°C. [Reference numerals] (100) Coating chamber; (200) Measuring part; (300) Control part