| 摘要 |
A substrate processing system as illustrated at ( 1 ). A substrate ( 2 ) lies upon a piston ( 3 ) shown in both the loading position ( 3 a) and in a processing position ( 3 b). The substrate is loaded via a port ( 4 ) through a door ( 5 ). The loading area ( 7 a), and/or the hole chamber ( 7 ) may be pumped out via a vacuum exhaust pipe ( 6 ) connected to a pump (not shown). A linear drive mechanism shown diagrammatically at ( 8 ) lifts the piston and the substrate in the chamber such that a process volume ( 7 b) of the chamber is defined with poor gas conduction between the piston and the walls of the chamber. |
