| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for an optical integrated element capable of widening a lateral width of an upper end of a ridge structure including a side etching layer, and narrowing a width of a lower end.SOLUTION: A manufacturing method for an optical integrated element comprises the steps of: causing a growth of a first semiconductor lamination part 4A on a semiconductor substrate 10; forming a first etching mask M1 which covers a part having grown on a first region 10b of the first semiconductor lamination part 4A and etching the first semiconductor lamination part 4A; and causing a growth of a second semiconductor lamination part 6A including an optical waveguide layer 34 and a clad layer 40 in a selective manner using the first etching mask M1. At this time, this manufacturing method makes a growth temperature of the clad layer 40 lower than a growth temperature of the optical waveguide layer 34, and also makes a V/III ratio when causing a growth of the clad layer 40 higher than a V/III ratio when causing a growth of the optical waveguide layer 34. |
