METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device and a semiconductor device capable of improving a yield of the semiconductor device having a first element whose upper surface is salicided and a second element whose upper surface is not salicided.SOLUTION: A method of manufacturing a semiconductor device according to an embodiment includes a block film formation step of forming a block film for blocking salicidation of a second element by a material containing at least carbon, on an upper surface of the second element in first and second elements formed on a semiconductor substrate.