| 摘要 |
PURPOSE: An atomic layer deposition apparatus having a susceptor capable of revolving and rotating is provided to revolve and rotate a substrate, thereby uniformly maintaining temperature and gas distribution in the substrate. CONSTITUTION: A rotary shaft(125) positioned in a lower part of a base unit(123) rotates the base unit. Multiple pocket units(121) are positioned in an upper part of the base unit in a rotatable manner. A rotation assisting unit is protruded to the lower part of the base unit after penetrating the base unit. A link is provided to a radial direction from the rotary shaft. A driving gear reciprocates the link about the rotary shaft. |
