| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device capable of reliably preventing sneak of a plasma to a shower plate rear face side during processing at low running costs.SOLUTION: A plasma processing device M1 comprises: a processing chamber 10; gas introduction means 3 for introducing gas in the processing chamber; and plasma generation means for generating the plasma in the processing chamber by exciting the gas introduced in the processing chamber. The gas introduction means is provided with a plate unit 30 opposed to a processing surface of a substrate S1 in the processing chamber. The plate unit is constituted by at least two shower plates 33, 33, 33laminated at equal intervals of 1 mm or less in an upward and downward direction. Plural injection ports H are bored on each shower plate, and each injection port of the shower plate positioned on an upper side is opposed to a portion of the shower plate immediately below it that has no injection port. The plasma processing device further comprises conduction means 4 for making electric potentials of each shower plate coincident with each other. |
