DEVICE FOR PROCESSING X-RAY DIFFRACTION MEASUREMENTS ON PARTS HAVING UNDERGONE A TREATMENT INDUCING STRESSES, AND ASSOCIATED ANALYSIS APPARATUS

摘要

The invention relates to a device (D) for processing sets of points which are representative of measurements of diffraction intensity as a function of diffraction angles obtained on a part (PI) made from a crystalline material and having residual stresses, and which equate to overall curves comprising a main peak and a shoulder. The device (D) comprises: a) first processing means (MT1) for determining, for each overall curve associated with the part (PI) and with a direction of analysis, i) main and secondary curves representative respectively of the main peak thereof and the shoulder thereof, the convolution of which reproduces the overall curve, ii) an extremum defined by an overall angular position of diffraction to which there corresponds a maximum diffraction intensity value resulting from a weighted combination of the maximum diffraction intensity values of the associated main and secondary curves, and iii) a parameter of deformation of the part (PI) in the direction of analysis from the overall angular position of diffraction; and b) second processing means (MT2) for determining a residual stress of the part (PI) from the deformation parameters determined in each of the directions of analysis of the sets of points.