发明名称 Memory Arrays and Methods of Forming Memory Cells
摘要 Some embodiments include methods of forming memory cells utilizing various arrangements of conductive lines, electrodes and programmable material; with the programmable material containing high k dielectric material directly against multivalent metal oxide. Some embodiments include arrays of memory cells, with the memory cells including programmable material containing high k dielectric material directly against multivalent metal oxide.
申请公布号 US2013193403(A1) 申请公布日期 2013.08.01
申请号 US201313781457 申请日期 2013.02.28
申请人 MICRON TECHNOLOGY, INC.;MICRON TECHNOLOGY, INC. 发明人 SMYTHE JOHN;SANDHU GURTEJ S.
分类号 H01L45/00 主分类号 H01L45/00
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