| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etching device capable of uniformly etching a substrate.SOLUTION: A lower electrode 130 is disposed in a vacuum container 101, and a substrate 190 is placed on an upper surface. An upper electrode 110 is oppositely disposed on the lower electrode 130 in the vacuum container 101 while keeping a gap. A gas introducing portion introduces etching gas 121 into between the upper electrode 110 and the lower electrode 130. An exhaust portion 180 is disposed at a lower position than the substrate 190, and exhausts the inside of the vacuum container 101. A straightening wall portion 150 is disposed so as to surround the substrate 190 along the edge of the substrate 190, and the etching gas 121 is made to stay on the substrate 190. The straightening wall portion 150 has straightening surfaces 151 intersecting a plane including an upper surface of the lower electrode 130 on a side facing an edge of the substrate 190. Concerning an angle between a lower surface of the straightening wall portion 150 and the straightening surface 151, the angle of the straightening surface 151 positioned away from the exhaust portion 180 is smaller than the angle of the straightening surface 151 positioned near the exhaust portion 180. |
