发明名称 SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT, AND ELECTRONIC DEVICE
摘要 Disclosed herein is a solid-state imaging element including: a semiconductor layer; a plurality of photoelectric conversion sections arranged within the semiconductor layer; and a pixel separating section disposed in a shape of a same width from a light receiving surface of the semiconductor layer to an opposite surface of the semiconductor layer from the light receiving surface in a position of separating the photoelectric conversion sections from each other for each pixel, the pixel separating section being formed by a material including an impurity.
申请公布号 US2013193547(A1) 申请公布日期 2013.08.01
申请号 US201313750693 申请日期 2013.01.25
申请人 SONY CORPORATION;SONY CORPORATION 发明人 NAKAZAWA MASASHI
分类号 H01L27/146;H01L31/18 主分类号 H01L27/146
代理机构 代理人
主权项
地址