发明名称 |
DIRECT COOLED ROTARY SPUTTERING TARGET |
摘要 |
A rotary deposition target bonded to a backing tube such that the bonding material is applied only at the ends of the rotary sputtering target to form a gap between the rotary sputtering target and the backing tube to enable a target cooling fluid used during the deposition process to contact the target directly and to provide a hermetic seal to contain the cooling fluid within the gap and prevent the fluid from being exposed to the environment within the deposition chamber.
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申请公布号 |
US2013192981(A1) |
申请公布日期 |
2013.08.01 |
申请号 |
US201313757000 |
申请日期 |
2013.02.01 |
申请人 |
AND SERVICES INC. MATERION ADVANCED MATERIALS TECHNOLOGIES;MATERION ADVANCED MATERIALS TECHNOLOGIES AND SERVICES INC. |
发明人 |
WITYAK GEORGE MICHAEL;COX LUTHER WILBURN |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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