发明名称 MOLYBDENUM ALLYL COMPLEXES AND USE THEREOF IN THIN FILM DEPOSITION
摘要 <p>Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R1, R3, R5, R7, R8 and R10 are independently and at each occurrence alkyl; R2, R6 and R9 are independently alkyl; R4 and R11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.</p>
申请公布号 WO2013112383(A1) 申请公布日期 2013.08.01
申请号 WO2013US22260 申请日期 2013.01.18
申请人 SIGMA-ALDRICH CO. LLC 发明人 ODEDRA, RAJESH;GARRATT, SHAUN;SALY, MARK;KANJOLIA, RAVI
分类号 C07F11/00;C23C16/00 主分类号 C07F11/00
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