发明名称 ELEMENT STRUCTURE, AND ELEMENT STRUCTURE MANUFACTURING METHOD
摘要 <p>[Problem] To provide an element structure, which is capable of protecting an element from oxygen, water, and the like, and is capable of suppressing deterioration and the like of the element, and to provide an element structure manufacturing method. [Solution] An element structure (1) is provided with a substrate (2), a device layer (3), a first protection layer (4), a second protection layer (5), and a sealing layer (6). The device layer (3) is formed in a first region (11) on the substrate (2). The first protection layer (4) has a first peripheral portion (4A) formed on the periphery of the device layer (3), and is formed of an inorganic material in a second region (12) on the substrate (2) to cover the device layer (3), said second region including the first region (11). The second protection layer (5) is formed of an organic material in a third region (13) on the first protection layer (4), said third region corresponding to the second region (12). The sealing layer (6) has a second peripheral portion (6A), which is formed on the periphery of the first peripheral portion (4A) and the second protection layer (5), and is formed of an inorganic material in a fourth region (14) on the substrate (2) to cover the second protection layer (5), said fourth region including the second region (12).</p>
申请公布号 WO2013111218(A1) 申请公布日期 2013.08.01
申请号 WO2012JP06938 申请日期 2012.10.30
申请人 ULVAC, INC. 发明人 KATO, YUKO;OKA, TADASHI;YAJIMA, TAKAHIRO;UCHIDA, KAZUYA;OMORI, DAISUKE
分类号 H05B33/04;H01L51/50;H05B33/10 主分类号 H05B33/04
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