| 摘要 |
PROBLEM TO BE SOLVED: To draw profile lines of a circuit pattern to be exposed with high accuracy even if the profile lines of the circuit pattern are complicated curves.SOLUTION: An exposure drawing device includes: acquisition means for acquiring profile data in which a circuit pattern to be drawn on an exposed substrate 150 is represented by profile lines, namely the profile data showing the profile lines represented by NURBS curves in which at least the curve part of the profile lines includes rank, a plurality of control point coordinate values, weight, and NOT vector as elements; detection means 110 for detecting position correction amounts of a position of the exposed substrate and a position of a drawing pattern; correction means 106 for correcting a plurality of control point coordinate values of the NURBS curves on the basis of the position correction amounts; derivation means 108 for deriving an exposure area of the exposed substrate on the basis of the profile data showing the profile lines of which at least curve parts are represented by the NURBS curves with the control point coordinate values changed by the correction means; and exposure means 162 for exposing the derived exposure area to draw the circuit pattern. |
