| 摘要 |
PROBLEM TO BE SOLVED: To effectively prevent the occurrence of an undesired resonance phenomenon without inducing the generation of a particle on a high-frequency transmission line around an upper electrode formed to be movable in up and down directions.SOLUTION: A capacitive coupling plasma processing device of cathode-coupling type comprises: a chamber 10; an upper electrode 44 provided in an upper portion of the chamber 10 to be movable in up and down directions; and a susceptor (lower electrode) 14 opposed to the upper electrode, provided that the upper electrode is arranged coaxially and in parallel with the susceptor. The upper electrode 44 has: an electrode main body 46 opposed to the susceptor 14; a conductive backing plate 48 opposed to a ceiling wall (top cover) 10b of the chamber 10; and a ring-like dielectric 52 for joining between a peripheral portion of the electrode main body 46 and a peripheral portion of the backing plate 48 so as to form a gap 50 therebetween. The backing plate 48 of the upper electrode 44 is physically and electrically connected through a bellows 72 to the chamber 10 which is a member at an earth potential. |
