发明名称 DEVICE AND METHOD FOR CORRECTING DEFECT
摘要 PROBLEM TO BE SOLVED: To prevent a circuit pattern formed on a substrate from being damaged by a laser beam in a device and a method for correcting a defect.SOLUTION: A device for correcting a defect includes an imaging portion for imaging circuit pattern areas 52, 53 and 54 on a substrate through an object lens, a defect detecting portion for comparing a defect image imaged by the imaging portion and a comparison pattern and detecting the defect on the substrate, a laser beam unirradiated area setting portion for making a laser beam shot light shielding pattern for shielding a laser beam irradiated on a circuit pattern on the substrate by setting an expansion coefficient in order to apply expansion treatment to an optional area of a reference light shielding pattern obtained by the comparison pattern, an irradiation area adjustment portion for shaping the laser beam irradiated to the substrate based on the laser beam shot light shielding pattern made by the laser beam unirradiated area setting portion, and a correction portion for correcting the defect by irradiating the laser beam shaped by the irradiation area adjustment portion to the substrate through the object lens.
申请公布号 JP2013146760(A) 申请公布日期 2013.08.01
申请号 JP20120009475 申请日期 2012.01.19
申请人 OLYMPUS CORP 发明人 NAGASHIMA AKIHIRO;YAMAZAKI RYUICHI;AKAHA TAKAYUKI
分类号 B23K26/00;B23K26/03;B23K26/06;G02F1/13;G02F1/1368 主分类号 B23K26/00
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