ALUMINUM COATED OR CERAMIC PARTS FOR SUBSTRATE DRIVE SYSTEM

摘要

Embodiments of the present invention relate to apparatus and methods for cleaning substrate carriers and components in a processing chamber. A processing chamber according to the embodiment of the present invention includes components that are encapsulated, coated or made with materials compatible with cleaning plasma. A substrate carrier according to embodiments of the present invention may be formed by or coated with materials compatible with cleaning plasma. According to the embodiments of the present invention, plasma cleaning may be performed in a processing chamber having one or more substrate carriers without the presence of any substrates to clean the one or more substrate carriers and the chamber components.