| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that gives resin patterns with a large height difference when resin patterns having different heights are simultaneously formed on one substrate.SOLUTION: The photosensitive resin composition includes the following components (A), (B), (C) and (D): (A) a resin having a structural unit derived from at least one compound selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride and a structural unit derived from a monomer having a 2-4C cyclic ether structure and an ethylenically unsaturated bond, in which the content of the structural unit derived from a monomer having a 2-4C cyclic ether structure and an ethylenically unsaturated bond is 30 to 99 mol% with respect to the whole structural units of the resin; (B) a polymerizable compound; (C) a polymerization initiator; and (D) a compound expressed by formula (1). In formula (1), Lrepresents a 1-6C alkane diyl group or -S-; Rand Reach represent a 1-6C alkyl group; and m and n each represent an integer of 0 to 3. |
