| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film compound solar cell manufacturing method suitable for mass production, which can perform etching in a short time without deteriorating etching rate of a sacrificial layer even in a large-sized substrate.SOLUTION: A thin film compound solar cell manufacturing method comprises: forming a sacrificial layer 3 on a substrate 1; forming a compound semiconductor layer on the sacrificial layer; partially exposing the sacrificial layer by removing a part of the compound semiconductor layer by etching; forming back electrodes 10; forming holes 11a and rear face insulation films 11; separating the substrate from the compound semiconductor layer by supplying an etchant through the holes to remove the sacrificial layer; bonding a reinforcement substrate to the rear face insulation film side of the compound semiconductor layer after bonding a pressure-sensitive adhesive sheet to the rear face insulation film side of the compound semiconductor layer; removing an etching stop layer 4 constituted on a solar cell region surface after separation of the substrate; patterning a first contact layer composing the compound semiconductor layer; forming a surface electrode on the patterned first contact layer; and separating the reinforcement substrate and the pressure-sensitive adhesive sheet. |
